• Hot Plate Annealing 1
  • Hot Plate Annealing 2
  • Hot Plate Annealing 3
  • Hot Plate Annealing
  • Hot Plate Annealing
  • Hot Plate Annealing

Hot Plate Annealing

產品說明
Configuration
  • Reactor chamber x 1
  • Cassette station x 1
  • Transferring robot x1
  • Oxygen analysis
 
Process
  • 12” wafer Cu annealing
  • Vacuum environment
  • Oxygen <30ppm
  • 100± 1 ºC
  • 400± 5 ºC
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